Wafer Marking

IL C2000

The IL C2000 was specifically developed for particle-free marking of 200mm wafers handled in a SMIF pod. The integrated Class 3 cleanroom mini-environment (ISO EN 14644-1) reliably keeps the wafer surface clean throughout the entire process—ideal for the highest purity requirements. Thanks to opto-mechanical alignment and a precise optional dual-arm robot system, the IL C2000 marks up to 160 wafers per hour and is also compatible with standard AGV and OHT loading systems.

Customizability

Individually configurable—for the right wafer marker

With a variety of optional features, the base machine can be individually expanded to meet our customers’ specific needs and requirements. Even a sorting function is available for the IL2000, allowing the system to be used as a wafer sorter.

Interior of the IL C2000 with laser and handling components
Laser marking on the wafer edge next to the notch
Cleanliness

Highest cleanliness thanks to ISO3 mini-environment

With up to two SMIF stations, up to 50 wafers can be loaded simultaneously on the machine. A slight overpressure is maintained in the process and transfer chambers at all times, ensuring that the wafers are exposed only to clean, filtered air.

SEMI-compliant marking
Up to 160 WPH
Marking accuracy approx. +/-100µm
ISO3 cleanroom
For high production volumes

The robot can be equipped as a single-arm or dual-arm system, making the IL C2000 ideal for medium to high production volumes with SMIF pods.

+49 8143 24195-0sales@il-semi.comDirectionsPersonal Support

Documents for the IL C2000

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  • Product catalogPDF · 6.0 MB
  • Technical data sheet IL C2000PDF · 378.4 KB

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